Description: Laboratory plasma cleaner, plasma etcher, and remote plasma source for photoresist ashing, descum, sample surface cleaning, surface activation, PDMS bonding, wire bonding, SEM/TEM sample cleaning, MEMS and IC chip packaging.
Menu Menu Home Products Applications Resources Contact About Us News update Laboratory plasma cleaner and etcher Laboratory plasma systems for plasma etching, surface cleaning, and activation. Fully automatic with the latest process control technology.
Remote plasma sources Remote plasma source to generate oxygen, hydrogen, CF4, SF6, ambient air plasma.
Remove hydrocarbon and fluorocarbon contamination inside SEM, FIB, TEM, XPS, and other high vacuum chambers. Reduce carbon deposition. Clean samples and chamber before ALD, epitaxial growth. Improve interface quality and reduce defects